Maria leads the development of advanced hybrid polymer materials at micro resist technology GmbH, focusing on solutions for micro- and nanofabrication.

Maria Russew earned her Diplom in Chemistry and her doctorate (Dr. rer. nat.) from Humboldt-Universität zu Berlin, where her doctoral research focused on azobenzene compounds and two-photon induced E/Z isomerization processes. At micro resist technology, her work centers on the design, characterization, and processing of UV-curable hybrid polymers for applications in micro-optics, photonics, optical waveguides, and nanoimprint lithography.