SCIL Nanoimprint Solutions offers solutions for making nano-structures on wafers by using its unique and proprietary lithography technology (SCIL). These nano-structures are used on optics and other photonic products to increase performance, lower end-product costs and increase functionality. SCIL or Substrate Conformal Imprint Lithography is a cost effective, robust, high yield process enabling nanometer resolution patterns on a large variety of materials. SCIL delivers proven, high quality imprints on wafer areas up to 300 mm. It can be used to make patterns with feature sizes down to less than 10 nm and overlay alignment below 1 µm. SCIL Nanoimprint Solutions helps customers with optimized equipment, consumable materials and processes for high volume production in markets such as AR/VR glasses, MicroLEDs, Lasers, Metasurfaces, Wiregrid polarizers and many more.