SCIL Nanoimprint Solutions offers solutions for making nano-structures on wafers by using
its unique and proprietary lithography technology (SCIL). These nano-structures are used on
optics and other photonic products to increase performance, lower end-product costs and
increase functionality. SCIL or Substrate Conformal Imprint Lithography is a cost effective,
robust, high yield process enabling nanometer resolution patterns on a large variety of
materials. SCIL delivers proven, high quality imprints on wafer areas up to 300 mm. It can be
used to make patterns with feature sizes down to less than 10 nm and overlay alignment
below 1 µm. SCIL Nanoimprint Solutions helps customers with optimized equipment,
consumable materials and processes for high volume production in markets such as AR/VR
glasses, MicroLEDs, Lasers, Metasurfaces, Wiregrid polarizers and many more.

SCIL Nanoimprint solutions
High Tech Campus 11
5656EA Eindhoven
The Netherlands

www.scil-nano.com